dc.contributor.author |
Skoczylas, W. P. |
|
dc.contributor.author |
Rempfer, G. F. |
|
dc.contributor.author |
Griffith, O. H. |
|
dc.date.accessioned |
2016-06-03T18:48:15Z |
|
dc.date.available |
2016-06-03T18:48:15Z |
|
dc.date.issued |
1994-10 |
|
dc.identifier.citation |
Skoczylas, W. P., Rempfer, G. F. and Griffith, O. H. (1994) Electron optical benches for in-line and branched systems. A new bench designed for mirror-based aberration correction and low energy electron microscopy. Rev. Sci. Instr. 65, 3183-3193, |
en_US |
dc.identifier.uri |
http://hdl.handle.net/1794/19933 |
|
dc.description |
6 pages |
en_US |
dc.description.abstract |
A review of electron optical bench literature is presented, and the designs of two optical benches
used by the authors are described. One bench was designed for testing individual electrostatic
electron lenses and in-line optical systems, for example, emission electron microscopes and
transmission electron microscopes. It has been in operation for many years. The second electron
optical bench is new. It is a branched system designed for several purposes: to study correction of
spherical and chromatic aberration with an electron mirror, and to gain experience with low energy
electron microscopy (LEEM) optics. The alignment of the electron optical support structure is
independent of the vacuum housing, and the bench is designed to be operated either horizontally or
vertically. As a demonstration of the performance of the new bench in the horizontal mode, a test
pattern on a silicon surface was imaged with LEEM optics. |
en_US |
dc.language.iso |
en_US |
en_US |
dc.publisher |
Review of Scientific Instruments |
en_US |
dc.rights |
Creative Commons BY-NC-ND 4.0-US |
en_US |
dc.title |
Electron optical benches for in-line and branched systems. A new bench designed for mirror-based aberration correction and low energy electron microscopy |
en_US |
dc.type |
Article |
en_US |