Photoelectron microscopy of organic surfaces: The effect of substrate reflectivity
Loading...
Date
1976-03
Authors
Dam, R. J.
Griffith, O. H.
Rempfer, G. F.
Journal Title
Journal ISSN
Volume Title
Publisher
Journal of Applied Physics
Abstract
Photoelectron measurements of thin organic films deposited on a metal substrate may contain information
from deep within the sample, derived from reflected ultraviolet light. This effect depends on the reflectivity
of the substrate, the sample thickness and optical absorption coefficient, and the photoelectron escape
depth. Calculations are given for phthalocyanine as a specific example. Contrast reversal and apparent seethrough
effects resulting from reflection are predicted in overlapping thin films. Photoelectron micrographs
of thin films and grid patterns of phthalocyanine show that the reflection model is essentially correct. This
effect can be substantially reduced by using a nitrocellulose-coated carbon substrate.
Description
5 pages
Keywords
Citation
Dam, R. J., Griffith, O. H. & Rempfer, G. F. (1976) Photoelectron microscopy of organic surfaces: The effect of substrate reflectivity. J. Appl. Phys. 47, 861‑865.