Photoelectron microscopy of organic surfaces: The effect of substrate reflectivity
| dc.contributor.author | Dam, R. J. | |
| dc.contributor.author | Griffith, O. H. | |
| dc.contributor.author | Rempfer, G. F. | |
| dc.date.accessioned | 2016-05-25T23:39:16Z | |
| dc.date.available | 2016-05-25T23:39:16Z | |
| dc.date.issued | 1976-03 | |
| dc.description | 5 pages | en_US |
| dc.description.abstract | Photoelectron measurements of thin organic films deposited on a metal substrate may contain information from deep within the sample, derived from reflected ultraviolet light. This effect depends on the reflectivity of the substrate, the sample thickness and optical absorption coefficient, and the photoelectron escape depth. Calculations are given for phthalocyanine as a specific example. Contrast reversal and apparent seethrough effects resulting from reflection are predicted in overlapping thin films. Photoelectron micrographs of thin films and grid patterns of phthalocyanine show that the reflection model is essentially correct. This effect can be substantially reduced by using a nitrocellulose-coated carbon substrate. | en_US |
| dc.identifier.citation | Dam, R. J., Griffith, O. H. & Rempfer, G. F. (1976) Photoelectron microscopy of organic surfaces: The effect of substrate reflectivity. J. Appl. Phys. 47, 861‑865. | en_US |
| dc.identifier.uri | https://hdl.handle.net/1794/19892 | |
| dc.language.iso | en_US | en_US |
| dc.publisher | Journal of Applied Physics | en_US |
| dc.rights | Creative Commons BY-NC-ND 4.0-US | en_US |
| dc.title | Photoelectron microscopy of organic surfaces: The effect of substrate reflectivity | en_US |
| dc.type | Article | en_US |